anx_I__cpt_1__cpt_6__cpt_2
4.2. Chemical installations for the production of basic inorganic chemicals, such as: gases, such as ammonia, chlorine or hydrogen chloride, fluorine or hydrogen fluoride, carbon oxides, sulphur compounds, nitrogen oxides, hydrogen, sulphur dioxide, carbonyl chloride; acids, such as chromic acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, sulphuric acid, oleum, sulphurous acids; bases, such as ammonium hydroxide, potassium hydroxide, sodium hydroxide; salts, such as ammonium chloride, potassium chlorate, potassium carbonate, sodium carbonate, perborate, silver nitrate; non-metals, metal oxides or other inorganic compounds such as calcium carbide, silicon, silicon carbide.
← anx_I__cpt_1__cpt_6__cpt_1__point_k__text_1 · All articles · anx_I__cpt_1__cpt_6__cpt_2__text_1 →
Source: EUR-Lex (Cellar) · retrieved 2026-10-22 · Text as adopted (Official Journal); later amendments are not incorporated in this text.