anx_III__table__44

X.E.IV.003 | Other “technology” as follows: a. Optical fabrication technologies for serially producing optical components at a rate exceeding 10 m2 of surface area per year on any single spindle and having all of the following: 1. Area exceeding 1 m2; and 2. Surface figure exceeding λ/10 (rms) at the designed wavelength; b. “Technology” for optical filters with a bandwidth equal to or less than 10 nm, a field of view (FOV) exceeding 40o and a resolution exceeding 0,75 line pairs per milliradian; c. “Technology” for the “development” or “production” of cameras controlled by X.A.IV.003; d. “Technology” “required” for the “development” or “production” of non-triaxial fluxgate “magnetometers” or non-triaxial fluxgate “magnetometer” systems, having any of the following: 1. “Sensitivity” lower (better) than 0,05 nT (rms) per square root Hz at frequencies of less than 1 Hz; or 2. “Sensitivity” lower (better) than 1 x 10-3 nT (rms) per square root Hz at frequencies of 1 Hz or more. e. “Technology” “required” for the “development” or “production” of infrared up-conversion devices having all of the following: 1. A response in the wavelength range exceeding 700 nm but not exceeding 1 500 nm; and 2. A combination of an infrared photodetector, light emitting diode (OLED), and nanocrystal to convert infrared light into visible light. Technical Note: For the purposes of X.E.IV.003, “sensitivity” (or noise level) is the root mean square of the device-limited noise floor which is the lowest signal that can be measured.

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Source: EUR-Lex (Cellar) · retrieved 2026-10-15 · Text as adopted (Official Journal); later amendments are not incorporated in this text.